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Cited article:
W. Feitknecht , W. Schütz
Rev. Met. Paris, 52 4 (1955) 327-334
Published online: 2017-03-14
This article has been cited by the following article(s):
8 articles
Voltammetry study of copper in chloride solution
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Anodic Copper Dissolution in the Presence of Cl- Ions at pH 12
M. Drogowska, L. Brossard and H. Menard Corrosion 43 (9) 549 (1987) https://doi.org/10.5006/1.3583899
Feste Korrosionsprodukte - I. Magnesium, Zink, Cadmium, Blei und Kupfer
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Inhibition of copper corrosion in chloride solutions by heterocyclic compounds
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Über die Hydroxidhalogenide Me2(OH)3Cl, ‐Br, ‐J zweiwertiger Metalle (Me = Mg, Ni, Co, Cu, Fe, Mn)
H. R. Oswald and W. Feitknecht Helvetica Chimica Acta 47 (1) 272 (1964) https://doi.org/10.1002/hlca.19640470136
The decomposition kinetics of copper hydride in the presence of electrolytes
J.C. Warf Journal of Inorganic and Nuclear Chemistry 19 (3-4) 304 (1961) https://doi.org/10.1016/0022-1902(61)80120-6
Passivierende Filme und Deckschichten Anlaufschichten
Walther Jaenicke Passivierende Filme und Deckschichten Anlaufschichten 160 (1956) https://doi.org/10.1007/978-3-642-48234-2_11