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Cited article:

Vacuum Carbosilicothermic Reduction of Zirconium, Hafnium, Vanadium, Niobium, Tantalum, and Chromium Oxides

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Inorganic Materials 58 (6) 594 (2022)
https://doi.org/10.1134/S0020168522050041

Facile Electrodeposition of Ti5Si3 Films from Oxide Precursors in Molten CaCl2

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The Crystallization Behavior of TiO2-CaO-SiO2-Al2O3-MgO Pentabasic Slag with a Basicity of 1.1–1.4

Huxu Lei, Chaowen Tan, Gangqiang Fan, Dejun Huang, Xiaoming Ding and Jie Dang
Crystals 11 (6) 583 (2021)
https://doi.org/10.3390/cryst11060583