| Issue |
Rev. Met. Paris
Volume 90, Number 12, Décembre 1993
|
|
|---|---|---|
| Page(s) | 1627 - 1630 | |
| DOI | https://doi.org/10.1051/metal/199390121627 | |
| Published online | 24 January 2017 | |
Direct observation of the mosaic structure of thermal oxide films on copper
Observation directe de la structure mosaïque des films d'oxyde thermique sur cuivre
The structure of thermal oxide films on copper has been investigated by optical microscopy, SEM and TEM of the stripped films and ultramicrotomed sections. High resolution transmission electron microscopy of the ultramicrotomed sections of the oxide film and the attached metal substrate revealed the mosaic structure of the oxide clearly at atomic-scale resolution for the first time. Thus, the correlation between the oxidation rate anisotropy and the anisotropy of the extent of paths for easy diffusion in the oxide has been confirmed. Further, examination of the oxide by XPS and EPMA has also shown the presence of CuO near the surface regions of the oxide, along with CusO constituting the bulk of the oxide even for the oxidation times shorter than about 10 min at 178 °C.
© La Revue de Métallurgie 1993
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