| Issue |
Rev. Met. Paris
Volume 93, Number 4, Avril 1996
|
|
|---|---|---|
| Page(s) | 581 - 587 | |
| DOI | https://doi.org/10.1051/metal/199693040581 | |
| Published online | 18 January 2017 | |
Silica film deposition control during alkaline electrocleaning*
Contrôle du dépôt de silice pendant l'électrodégraissage en milieu alcalin
To avoid tinplate fabrication problems, the silica deposited during the cleaning step should be controlled in a narrow range (between 2 and 3 mg/m2). A first study has allowed to determine the mechanisms involved. Based on this fundamental research, a simulation of an industrial cleaning has emphasized the most important parameters to keep under control for a homogeneous deposit to be achieved.
Subject of a lecture at the ATS International Steelmaking Conference 1995 (Paris, 6-7 December, 1995, Session 6).
This research was carried out under the sponsorship of IRSIA (Institut pour l'encouragement de la Recherche Scientifique dans l'Industrie et l'Agriculture) and ECSC (European Steel and Coal Community).
The authors wish to express their gratitude to Messrs V. Tusset and V. Muller, their colleagues from the CRM Analytical Research Department, for their assistance in surface pollution and unit surface area silica film weight assessments.
They are also indebted to Dr V. Leroy, director of the Material Science Branch, for his critical review of the present report and many stimulating discussions about it.
© La Revue de Métallurgie 1996
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