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This article has been cited by the following article(s):
Comprehensive Investigation on the Stability of Silicon Nitride/Oxynitride as Thin-Film Encapsulation Layers Prepared by Plasma-Enhanced Chemical Vapor Deposition
Songju Li, Min Li, Linfeng Lan, Dong Fu, Xianwen Sun and Zhuo Gao ACS Applied Materials & Interfaces 17(7) 10832 (2025) https://doi.org/10.1021/acsami.4c20848
Hydrogen Role on the Properties of Silicon Nitride for Flexible Thin Film Encapsulation