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Cited article:

Comprehensive Investigation on the Stability of Silicon Nitride/Oxynitride as Thin-Film Encapsulation Layers Prepared by Plasma-Enhanced Chemical Vapor Deposition

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ACS Applied Materials & Interfaces 17 (7) 10832 (2025)
https://doi.org/10.1021/acsami.4c20848

Hydrogen Role on the Properties of Silicon Nitride for Flexible Thin Film Encapsulation

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physica status solidi (a) 221 (10) (2024)
https://doi.org/10.1002/pssa.202300815

Effects of Hydrogen Bonding in Silicon Nitride/Polyimide Passivation Bilayer in SiC Power Devices

Antonino Scandurra, Gabriele Bellocchi, Giuseppe Arena, Simone Rascunà, Michele Calabretta, Massimo Boscaglia, Mario Saggio, Giacometta Mineo, Valentina Iacono, Stefano Boscarino, Salvatore Mirabella, Francesco Ruffino and Maria Grazia Grimaldi
physica status solidi (a) 221 (17) (2024)
https://doi.org/10.1002/pssa.202400273

Permeation of oxygen and water into a plasma-enhanced chemical vapor deposited silicon nitride film as function of deposition pressure

Masayuki Shiochi, Hiroshi Fujimoto, Hin Wai Mo, Keiko Inoue, Yusaku Tanahashi, Hiroyuki Hosomi, Takashi Miyamoto, Hiroshi Miyazaki and Chihaya Adachi
Journal of Vacuum Science & Technology B 41 (6) (2023)
https://doi.org/10.1116/6.0003050

Failure of a brittle layer on a ductile substrate: Nanoindentation experiments and FEM simulations

M. Rusinowicz, G. Parry, F. Volpi, et al.
Journal of the Mechanics and Physics of Solids 163 104859 (2022)
https://doi.org/10.1016/j.jmps.2022.104859