Open Access
Table 1
Deposition conditions.
| Reagents | RF frequency [MHz] |
Pressure [mTorr] |
Power [W] |
|
|---|---|---|---|---|
| HF | SiH4/N2/NH3 | 13.56 | 650 | 60 |
| LF | SiH4/N2/NH3 | 0.10 | 650 | 60 |
| LF Free NH3 | SiH4/N2 | 0.10 | 1000 | 60 |
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